Cleaning and Wet-etching

Servicing Material & Equipment suppliers, Semiconductor wafer fabrication as well as the Medical and Watch Industry. Focus areas include sensors MEMS, lighting LED, photovoltaic PV, power ICs, advanced packaging etc. Covering a wide range of applications including Wet systems for Cleaning, Etching, Drying, Coating & Developing, PR stripping as well as chemical management systems. Offering single wafer as well as manual wetbench, semi-automated and fully-automated wetbench systems also for the R&D Laboratory (Manual Wet Process, SpinStep etching, Rinse step drying, Single wafer wetbench, Glove cleaner).

Benefits

  • Complete wet process provider
  • Customized configuration according to customer requirements
  • In-house Demo test facility for customer applications
  • Process Qualification
  • Modular design for easy installation
  • Optimized footprint
  • Refurbishing Service, Spare parts obsolescence availability
  • Global service, Hotline, spare parts supply

Equipments:

Wet Process Manual / R&D Laboratory

Limited automation – unlimited process capability.
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Spin Step / R&D Laboratory

Spinning system for coating and developing for substrates up to 300mm. Available as build in or table top unit.

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SpinStep Flex line / R&D Laboratory

The modular, versatile single wafer system for etching, cleaning, lift-off, coating and developing.
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RinseStep Drying / R&/D Laboratory

The modular, versatile single wafer system for etching, cleaning, lift-off, coating and developing.
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Glove cleaner / R&D Laboratory

System to clean and dry your gloves.

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SpinEtcher SPE 200

For FEOL and BEOL processes like roughness etching, stress relief, polishing and film removel.
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Spin Mask

Processor for mask cleaning and etching processes.
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Semi Automated TwinStep

Designed for up to 50 wafers 1Semi-automated wet bench system for wafer cleaning, etching, stripping or developing.
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Automated MultiStep Wet Processing

Fully automated compact and durable wet processing tool Excellent for flexibility and variable process requirements. Designed for up to 8″ wafers.
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Fully automated compact wet processing tool

User friendly thanks to innovative software solution Designed for up to 12″ wafers.

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NID Dry (Nitrogen-IPA-Dispense Dryer)

Stressless Marangoni wafer handling (NO BREAKAGE), low metal contamination and IPA consumption.
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CleanStep Carrier Box

Efficient carrier/FOUP cleaning and drying by combining multiple work steps in one single tool.
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CleanStep Parts

Etching and cleaning of PECVD and diffusion boats (Graphite boats, quartz part, SiC boats etc.).
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SpinEtcher from SEMI|PARTS

Proven tool for FEOL and BEOL processes.
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Spin Lift-off

Advanced metal lift-off process tool.
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CleanStep Tube

Semi automated tube cleaner for horizontal or vertical quartz tube cleaning.
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Chemical Supply Systems / Chemical Management Systems

Fully automated chemical management systems to handle acids, solvents and caustics used in the semiconductor, micro mechanic and solar industries. Available for the following applications:
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