Processor for mask cleaning and etching processes.
Mask processor from SEMI|PARTS. Our proved tool for mask cleaning and etching processes.
BENEFITS
• Suitable for masks and other substrates
• Piranha process used to clean organic residues off substrates
• SC1 base peroxide mixture removes organic residues and is also very
effective in removing particles from the surface
• Low chemical and water consumption
• High safety levels for chemical usage
• Easy to change mask/wafer size
• State of the art software with multi touch functions
• Optimized footprint
• Easy to configure and upgradeable
APPLICATIONS
The SpinMask is designed for processes like:
• Photo mask cleaning
• Photo mask etching
• Photo mask resist strip
OPTIONS
• Piranha Process
• Standard clean SC1
• Single side brush
• High pressure cleaning
• CO2 ionisation unit
• Mini chemical dispense and mixture system
• SECS GEM Interface
• Efficient chuck and bowl cleaning system
